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Electron-Impact Total Ionization Cross Sections of Silicon and Germanium Hydrides

机译:硅和锗氢化物的电子碰撞总电离截面

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摘要

Electron-impact total ionization cross sections of some silicon and germanium compounds have been calculated by applying a new theoretical model that has been found to be reliable for a wide range of molecules. The new theory, the binary-encounter-Bethe (BEB) model, combines the binary-encounter theory and the Bethe theory for electron-impact ionization, and uses simple theoretical molecular orbital data—binding energies, average kinetic energies, and occupation numbers—which are readily available from molecular structure codes. Total ionization cross sections of SiH, SiH2, SiH3, SiH4, Si2H6, Si(CH3)4, GeH, GeH2, GeH3, GeH4, and Ge2H6 are presented for incident electron energies T from threshold to 1 keV, and compared to available experimental data. Theory and experiment agree well for SiHx, x=1–4, from thresholds to T\u3c80 eV, while theoretical peaks occur at lower T than experimental peaks for SiHx, x=1–3. No experimental data are available for germanium hydrides for comparison. The theoretical cross sections are given by a compact analytic form suitable for applications in plasma processing.
机译:通过应用一种新的理论模型已经计算出了一些硅和锗化合物的电子碰撞总电离截面,该模型已经发现对于多种分子都是可靠的。新理论是二元相遇Bethe(BEB)模型,它将二元相遇理论和Bethe理论用于电子碰撞电离,并使用简单的理论分子轨道数据-结合能,平均动能和占有数-可以容易地从分子结构代码获得。给出了从阈值到1 keV的入射电子能量T的SiH,SiH2,SiH3,SiH4,Si2H6,Si(CH3)4,GeH,GeH2,GeH3,GeH4和Ge2H6的总电离截面,并与可用的实验数据进行了比较。从阈值到T \ u3c80 eV,SiHx(x = 1–4)的理论和实验非常吻合,而理论峰出现在比SiHx(x = 1–3)的实验峰低的T处。没有实验数据可用于比较氢化锗。理论截面由紧凑的分析形式给出,适用于等离子体处理。

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